| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a semiconductor device and a dimension measurement method therefor that accurately measure and manage pattern dimensions. <P>SOLUTION: The semiconductor device has a device region and a TEG region outside the device region, and a line-and-space pattern 21 in the TEG region 10 has a plurality of reference patterns 12 arrayed regularly at predetermined intervals and a specific pattern 13 arranged near the reference patterns 12. The plurality of reference patterns 12 has the same shape, and the specific pattern 13 is formed in a different shape from the reference patterns 12 or the layout relationship of the specific pattern 13 to the reference patterns 12 is different from the array of the reference patterns 12. <P>COPYRIGHT: (C)2009,JPO&INPIT |
