发明名称 |
MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a manufacturing method of a semiconductor device capable of preventing the circuit surface of a semiconductor chip from being contaminated by an adhesive layer and improving the adhesion force between a semiconductor chip and a glass substrate via the adhesive layer in the manufacture of the semiconductor device for mounting an image sensor, such as a CMOS sensor. <P>SOLUTION: The manufacturing method of the semiconductor device 1 comprises: a process for providing an adhesive layer 7 made of a film-like photosensitive adhesive on a surface 3a of the glass substrate 3 having a front 3a and a rear 3b that oppose each other; a process for applying light from the side of the rear 3b for exposing the adhesive layer 7 to the light and patterning the adhesive layer 7 by development; and a process for directly adhering a semiconductor chip 5 to the patterned adhesive layer 7 so that the circuit surface of the semiconductor chip 5 faces the side of the glass substrate 3. <P>COPYRIGHT: (C)2009,JPO&INPIT |
申请公布号 |
JP2009141018(A) |
申请公布日期 |
2009.06.25 |
申请号 |
JP20070313905 |
申请日期 |
2007.12.04 |
申请人 |
HITACHI CHEM CO LTD |
发明人 |
MITSUKURA KAZUYUKI;KAWAMORI TAKASHI;MASUKO TAKASHI;KATOGI SHIGEKI |
分类号 |
H01L23/02;G03F7/037;H01L27/14 |
主分类号 |
H01L23/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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