| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate transfer apparatus that prevents a substrate from hanging down to allow an etchant to flow easily on both sides of the substrate without being accumulated in an etching process. SOLUTION: The substrate transfer apparatus transfers the substrate during the etching process of the substrate, and includes a substrate support base which supports both sides of the substrate which is curved to cause the etchant to flow on both sides of the substrate, and a transfer drive section which moves the substrate support base to transfer the substrate. COPYRIGHT: (C)2009,JPO&INPIT |
