MONITOR WAFER AND METHOD OF MANUFACTURING THE SAME

摘要

PROBLEM TO BE SOLVED: To provide a monitor wafer which has a flattened surface enough high in accuracy to detect micro particles and can be used as a particle monitor wafer requiring high surface flatness by comparatively many times, and to provide a method of manufacturing the monitor wafer. SOLUTION: The monitor wafer is provided with an SiC wafer formed of an SiC crystal that is formed by a CVD method and a film with non-transparency which is formed on the uppermost layer of the SiC wafer. The film with non-transparency is a polycrystalline Si film which is formed by the low-pressure vapor phase growth method. COPYRIGHT: (C)2009,JPO&INPIT