| 摘要 |
PROBLEM TO BE SOLVED: To improve processing accuracy of a sample in processing the sample using a focused ion beam, in a sample processing method and a sample processing apparatus. SOLUTION: In the sample processing method, a positional reference mark is formed in a sample 1. The positional reference mark is scanned with a focused ion beam to acquire positional information on the positional reference mark of the sample 1, and the focused ion beam's irradiation position on the sample 1 is corrected based on the positional information to process the sample 1. Mark sections 3, 4 are formed on the sample 1, and either one of the marksections 3, 4 is scanned with the focused ion beam to acquire positional information on either one of the mark sections 3, 4. Based on the positional information, the focused ion beam's irradiation position on the sample 1 is corrected to process the sample 1. COPYRIGHT: (C)2009,JPO&INPIT
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