发明名称 METHOD AND DEVICE FOR MEASURING METAL CONTAMINANT
摘要 PROBLEM TO BE SOLVED: To provide a method and a device for measuring metal contaminants capable of measuring contamination of substrates or contamination condition of test liquids even with simple device construction. SOLUTION: The metal contaminant measuring device 1 consists of a substrate 2; a test liquid containing section 3 to contain and contact a test liquid of a measurement object on one side of the substrate 2; a measurement liquid containing section 4 to contain and contact a liquid having a metal contaminant concentration lower than that of the test liquid on the other side of the substrate 2; a measurement means 5 measuring a metal contaminant concentration of a measurement liquid contained in the measurement liquid containing section 4; and stirring means 6, 7 stirring respectively the test liquid contained in the test liquid containing section 3 and the measurement liquid contained in the measurement liquid containing section 4. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009139148(A) 申请公布日期 2009.06.25
申请号 JP20070313955 申请日期 2007.12.04
申请人 NOMURA MICRO SCI CO LTD;TSUDA MASAYUKI 发明人 YONEHARA TAKAHIRO;TSUDA MASAYUKI
分类号 G01N1/28 主分类号 G01N1/28
代理机构 代理人
主权项
地址