发明名称 |
METHOD AND DEVICE FOR MEASURING METAL CONTAMINANT |
摘要 |
PROBLEM TO BE SOLVED: To provide a method and a device for measuring metal contaminants capable of measuring contamination of substrates or contamination condition of test liquids even with simple device construction. SOLUTION: The metal contaminant measuring device 1 consists of a substrate 2; a test liquid containing section 3 to contain and contact a test liquid of a measurement object on one side of the substrate 2; a measurement liquid containing section 4 to contain and contact a liquid having a metal contaminant concentration lower than that of the test liquid on the other side of the substrate 2; a measurement means 5 measuring a metal contaminant concentration of a measurement liquid contained in the measurement liquid containing section 4; and stirring means 6, 7 stirring respectively the test liquid contained in the test liquid containing section 3 and the measurement liquid contained in the measurement liquid containing section 4. COPYRIGHT: (C)2009,JPO&INPIT
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申请公布号 |
JP2009139148(A) |
申请公布日期 |
2009.06.25 |
申请号 |
JP20070313955 |
申请日期 |
2007.12.04 |
申请人 |
NOMURA MICRO SCI CO LTD;TSUDA MASAYUKI |
发明人 |
YONEHARA TAKAHIRO;TSUDA MASAYUKI |
分类号 |
G01N1/28 |
主分类号 |
G01N1/28 |
代理机构 |
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代理人 |
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地址 |
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