发明名称 STAGE APPARATUS, EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD
摘要 <p>A stage apparatus is provided with a movable body (28), which holds a mask to be irradiated with exposure light and moves along a prescribed surface, and a flow control section (50), which moves substantially with the movement of the movable body and controls an air flow in the vicinity of the mask.</p>
申请公布号 WO2009078422(A1) 申请公布日期 2009.06.25
申请号 WO2008JP72941 申请日期 2008.12.17
申请人 NIKON CORPORATION;SHIBAZAKI, YUICHI 发明人 SHIBAZAKI, YUICHI
分类号 H01L21/027;H01L21/68 主分类号 H01L21/027
代理机构 代理人
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