| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method of manufacturing an imaging apparatus enabling a precise position adjustment of an image sensor quickly. <P>SOLUTION: There are first to fourth processes in the method of manufacturing the imaging apparatus for receiving a pair of luminous fluxes AB1, AB2 emitted from regions 341, 342, where the pupil of an optical system differs, and assembling the image sensor 111, where a focus detection pixel 116 for detecting the focus adjustment state of the optical system exists on an imaging surface 114, to a camera body 10. In the first process, an image pattern 300 is formed on a scheduled focal plane FP of the optical system. In the second process, imaging patterns 421, 422 corresponding to the imaging pattern 300 are acquired on an imaging surface 114. In the third process, amounts of defocus def0, def2, def3 to the scheduled focal plane FP of the imaging surface 114 are detected based on output from a focus detection pixel 116. In the fourth process, the position or posture of the image sensor 111 is adjusted based on the detected amounts of defocus. <P>COPYRIGHT: (C)2009,JPO&INPIT |
