| 摘要 |
<P>PROBLEM TO BE SOLVED: To reduce a possible impact of acoustic vibration to a part of a lithographic apparatus, and to thereby enhance the precision of the lithographic apparatus, overlay, or all other parameters. <P>SOLUTION: A lithographic apparatus may be provided with an acoustic resonator to attenuate acoustic vibration in the lithographic apparatus. The acoustic resonator may include a Helmholtz resonator. The Helmholtz resonator may be provided with an active element to provide active damping and/or altering a spring characteristic of the mass spring assembly formed by the resonator. The resonator may be provided at a slit in a shield between the patterning device stage and the projection system to suppress the transfer of acoustical vibration caused by e.g. the movement of the patterning device stage to the projection system. <P>COPYRIGHT: (C)2009,JPO&INPIT |
