| 摘要 |
PROBLEM TO BE SOLVED: To provide substrate processing equipment which can control generation of new particles even if alkaline processing liquid and acid processing liquid are used. SOLUTION: Substrate processing equipment comprises a substrate holding section 1 for holding a substrate W and capable of rotating along with the substrate W, a processing liquid supply mechanism 2 equipped with a first processing liquid supply section 2a for supplying processing liquid containing alkaline to the substrate W held at the substrate holding section 1, and a second processing liquid supply section 2b for supplying processing liquid containing acid to the substrate W held at the substrate holding section 1, a drain cup 3 provided on the outside of the substrate holding section 1 and equipped with an outer circumferential wall 3a on the periphery of the substrate holding section 1, an outer cup 4 provided on the outside of the drain cup 3, an elevating/lowering cup 8 elevating/lowering between the drain cup 3 and the outer cup 4, and a chamber 4b provided between the drain cup 3 and the outer cup 4 and cleaning the elevating/lowering cup 8. COPYRIGHT: (C)2009,JPO&INPIT
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