发明名称 Capacitor for Semiconductor Device and Method of Manufacturing the Same
摘要 Provided is a capacitor for a semiconductor device. The capacitor comprises a bottom electrode, a dielectric pattern, and a top electrode. The bottom electrode has an uneven surface. The dielectric pattern is on the bottom electrode, and the top electrode is on the dielectric pattern. The bottom electrode has a first height in edge and center regions thereof, and a protrusion between the edge region and the center region of the bottom electrode having a second height greater than the first height.
申请公布号 US2009161291(A1) 申请公布日期 2009.06.25
申请号 US20080336511 申请日期 2008.12.16
申请人 KIM SANG KWON 发明人 KIM SANG KWON
分类号 H01G4/008;H01L21/336 主分类号 H01G4/008
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