LIQUID MATERIAL VAPORIZATION APPARATUS

摘要

A liquid material vaporization apparatus capable of increasing the flow rate of a carrier gas CG without changing the shape of a nozzle comprises a gas-liquid mixing chamber (1) in which a liquid material LM and the carrier gas CG are mixed, a liquid material introduction path (2) which introduces the liquid material LM into the gas-liquid mixing chamber (1), a carrier gas introduction path (3) which introduces the carrier gas CG into the gas-liquid mixing chamber (1), a vaporization nozzle part (4) which communicates with the gas-liquid mixing chamber (1) to subject a mixture of the liquid material LM and the carrier gas CG to vaporization under a reduced pressure, a mixed gas derivation path (5) which communicates with the vaporization nozzle part (4) to derive the mixed gas MG vaporized by the vaporization nozzle part (4), and a bypass path (6) through which the carrier gas introduction path (3) communicates with the mixed gas derivation path (5) and which flows the carrier gas CG from the carrier gas introduction path (3) to the mixed gas derivation path (5).