发明名称 METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE AND SEMICONDUCTOR DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a method for manufacturing a semiconductor device applied to a quantum dot laser element capable of improving a temperature characteristic. SOLUTION: The quantum dot (14Q) including In and As is formed on a semiconductor substrate (11). A barrier layer (14B) comprising a compound semiconductor including Al as group III element so as to cover the quantum dot and having electron affinity smaller than that of the quantum dot is formed by organic metal chemical vapor growth by the use of triethylaluminum as an Al raw material. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009141032(A) 申请公布日期 2009.06.25
申请号 JP20070314118 申请日期 2007.12.05
申请人 FUJITSU LTD 发明人 OKUMURA JIICHI
分类号 H01S5/343;H01S5/227 主分类号 H01S5/343
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