| 摘要 |
PROBLEM TO BE SOLVED: To remove resist on a substrate in a plane uniform state at a low temperature of≤90°C. SOLUTION: In an atmosphere where the internal pressure in a reaction system in which the substrate 16 is stored is controlled to pressure lower than the atmospheric pressure so that the temperature of the substrate 16 is≤90°C, a shower head 12 supplies an ozone gas and an unsaturated hydrocarbon gas to the substrate 16 to remove the resist 17 on the substrate 16. The shower head 12 includes a space 41 where the ozone gas circulates, a space 42 where the unsaturated hydrocarbon gas circulates, and a diffusion plate 31 which diffuses the ozone gas in the space 41 and the unsaturated hydrocarbon gas in the space 42 individually to a surface of the substrate. COPYRIGHT: (C)2009,JPO&INPIT
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