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发明名称
Pattern lock system for particle-beam exposure apparatus
摘要
申请公布号
GB2435348(B)
申请公布日期
2009.06.24
申请号
GB20070008916
申请日期
2005.11.15
申请人
IMS NANOFABRICATION AG
发明人
GERHARD STENGL;HERBERT BUSCHBECK;ROBERT NOWAK
分类号
H01J37/317
主分类号
H01J37/317
代理机构
代理人
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