发明名称 |
Coating process for manufacture or reprocessing of sputter targets and X-ray anodes |
摘要 |
In various embodiments, large-area sputtering targets are formed by providing a plurality of sputtering targets each comprising a backing plate and a refractory metal layer disposed thereon, and spray depositing a refractory metal powder on an interface between the sputtering targets, the refractory metal powder consisting essentially of the same metal as each refractory metal layer, thereby joining the refractory metal layers of the sputtering targets. |
申请公布号 |
ZA200709470(B) |
申请公布日期 |
2009.06.24 |
申请号 |
ZA20070009470 |
申请日期 |
2007.11.02 |
申请人 |
H C STARCK INC. |
发明人 |
ZIMMERMANN, STEFAN;PAPP, UWE;KELLER, HANS;MILLER, STEVEN ALFRED |
分类号 |
C23C;H01J |
主分类号 |
C23C |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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