发明名称 Test photomask, flare evaluation method, and flare compensation method
摘要 <p>Through use of a line pattern (1) which becomes a pattern under measurement and a zone pattern (2) in a zonal shape which becomes a flare causing pattern forming a light transmission region which surrounds the line pattern (1) and causes local flare to occur on the line pattern (1), the effect of the local flare due to the zone pattern (2) on the line pattern (1) is measured as a line width of the line pattern (1) for evaluation. Further, this measurement value is used to compensate for the effect of the local flare on each real pattern. &lt;IMAGE&gt;</p>
申请公布号 EP1387219(B1) 申请公布日期 2009.06.24
申请号 EP20030252220 申请日期 2003.04.08
申请人 FUJITSU MICROELECTRONICS LIMITED 发明人 YAO, TERUYOSHI;HANYU, ISAMU;KIRIKOSHI, KATSUYOSHI
分类号 G03F7/20;G03F1/36;G03F1/68;G03F1/70;H01L21/027 主分类号 G03F7/20
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