PLASMA PROCESSING APPARATUS

摘要

A plasma processing apparatus is provided to shorten a rod exchanging process time in 1/10 by installing a convex structure in a light-transmitting material lot. A plasma processing apparatus includes an upper electrode, a lower electrode(130), and a detector. The upper electrode discharges a source gas through a shower plate(115) within a vacuum receptacle. The lower electrode is installed opposite to the upper electrode. A processing target sample is loaded on the lower electrode. The detector detects the light from the surface of the processing target sample through the shower plate. The plasma processing apparatus generates plasma between the shower plate and the lower electrode in order to process the processing target sample. The detector includes a light introduction unit and a spectroscope. The light introduction unit is made of a light-transmitting material. The spectroscope analyzes the light of the light introduction unit.