发明名称 BARRIER FILM FORMING METHOD
摘要 A barrier film consisting of a ZrB2 film is formed by using a film forming device provided with a plasma generating means composed of a coaxial resonant cavity provided with a conductor arranged spaced apart from and around a non-metal pipe for introducing reaction gas, and a microwave supply circuit for exciting the above coaxial resonant cavity, wherein the plasma generating means is constituted such that the internal height of the coaxial resonant cavity is integral multiples of 1/2 of an exciting wavelength, and gas injected from one end of the non-metal pipe is excited by a microwave at a position not covered with the conductor of the non-metal pipe and is released from the other end in the form of plasma.
申请公布号 KR20090067201(A) 申请公布日期 2009.06.24
申请号 KR20097009544 申请日期 2007.11.08
申请人 ULVAC, INC. 发明人 HATANAKA MASANOBU;ISHIKAWA MICHIO;TSUMAGARI KANAKO
分类号 H01L21/285;C23C16/38;H01L21/28 主分类号 H01L21/285
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