发明名称
摘要 The purpose of the invention is to provide a forgery/alteration protective material which containing a retroreflecting material and having an improved forgery/alteration protecting effect against the process of the upper part of the material. In order to achieve the above purpose, the forgery/alteration protective material 2 according to the invention where a retroreflecting material 4 for returning the incident light substantially along the path along which the incident light travels is provided and a transparent film 6 is layered on the retroreflecting material 4 is characterized in that a low transmittance layer 8 formed of a material having a lowerer light transmittance than that of the transparent film 6 is provided between the retroreflecting material 4 and the transparent film layer 6, and the light transmittance of the low transmittance layer 8 is 45% or higher to the light in the wavelength range of 420 nm to 700 nm. <IMAGE>
申请公布号 JP4283424(B2) 申请公布日期 2009.06.24
申请号 JP20000208872 申请日期 2000.07.10
申请人 发明人
分类号 B41M3/14;G02B5/02;B32B27/00;B42D15/00;B42D15/10;G02B1/10;G02B5/128;G02B5/136;G02B5/28 主分类号 B41M3/14
代理机构 代理人
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