| 摘要 |
A method and an apparatus for cleaning a chamber by in-situ plasma excitation is provided to improve a plasma characteristic control by using a main body of a chamber as a resonant cavity part. A substrate processing chamber(100) includes a chamber body, a movable substrate holder, a plasma supply source(122), a vacuum pump, and a gas supply source(125). At least, one plasma supply source opening is formed at a sidewall of the chamber body. The movable substrate holder is formed at a first position under the plasma supply source opening and a second position above the plasma supply source opening. The movable substrate holder is positioned within the chamber body. The plasma supply source is connected to the plasma supply source opening. The vacuum pump is connected to the chamber body in order to pump a fluid. The gas supply source is connected to the chamber body in order to inject the gas.
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