发明名称 Contact material and system for ultra-clean applications
摘要 Techniques for minimizing contamination by particles that wear off of components that come into and out of contact with each other. The invention involves forming at least one of the components out of a magnetic material so that the particles that wear off of the component are magnetic themselves. Then a magnetic field is used to attract the particles. In one embodiment, the particles are attracted to and collected by a magnet. In this way, the particles are drawn away from any components that might be contaminated. In some embodiments, the magnetic component is also magnetized. In other embodiments, a magnet is placed in contact with the magnetic component. In other embodiments, each of the components that come into contact with each other are formed of a magnetic material.
申请公布号 US7551265(B2) 申请公布日期 2009.06.23
申请号 US20040956606 申请日期 2004.10.01
申请人 NIKON CORPORATION 发明人 PHILLIPS ALTON H.
分类号 G03B27/62;B65D85/00;G03B27/42;G03B27/52;G03F1/00 主分类号 G03B27/62
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