METHOD OF FABRICATING IMAGE SENSOR AND IMAGE SENSOR FABRICATED BY THE SAME

摘要

An image sensor manufacturing method and an image sensor manufactured thereby are provided to improve process stability and to increase a yield by preventing damage of a micro lens and generation of particles due to organic materials of the micro lens in a manufacturing process. A semiconductor substrate(101) in which a pixel region(A) and a pad area(B) are defined is provided. An active pixel sensor array and a color filter(510) formed on the active pixel sensor array are formed on the semiconductor substrate of the pixel region. A metal pad(330) is formed on the semiconductor substrate of the pad area. An upper part of the semiconductor substrate is planarized by a planarization layer(520). The micro lens is formed on an upper part of the planarization layer of the pixel region. A micro lens protection layer(620) formed with the non-photosensitive polymer layer is formed on the planarization layer in which the micro lens is formed. A mask layer for exposing an upper region of the metal pad is formed on the micro lens protection layer. The micro lens protection layer and the planarization layer are partially removed by using the mask layer as an etch mask. A partial upper side of the metal pad is exposed. The mask layer is removed.