| 摘要 |
A shower plate electrode of a plasma CVD reactor is provided to uniformity of deposition and to diversify size of a hole processing region according to size of the whole surface of a shower plate or a substrate to be processed. A shower plate electrode of a plasma CVD reactor includes the following steps of: removing a processed wafer by a susceptor of a chamber; supplying cleaning gas into a remote plasma discharge unit; activating the cleaning gas by using plasma energy in the remote plasma discharge unit; and transferring the activated cleaning gas into the chamber through a plurality of holes(220) of the shower plate facing with the susceptor.
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