APPARATUS AND METHOD FOR THE REMOVAL OF PELLICLES FROM MASKS

摘要

An apparatus and a method for removing a film from a mask are provided to remove the film from the mask by using a conventional method without causing the pollution and the damage of the mask. An apparatus for removing a film from a mask for which can be used for photolithography includes at least one grip, at least one detector, a heater, and a removal unit. The grip includes at least two fixing elements coupled with an edge of the mask by using compressive force. The grip is used for operating the mask having a film(2). The detector determines a non-contact position of a mount(2.1). The mount is formed radially in an outer edge of the film. The heater heats an adhesive. The adhesive is used for fixing the film on the mask in order to obtain material continuity. The removal unit includes a mask fixing device and a film removal device. The removal unit removes the film from the mask.