发明名称 Method for separating semiconductor substrate
摘要 A method of separating a semiconductor substrate having an implementation member attached thereon includes a dividing process for at least the implementation member on the semiconductor substrate along a separation line, a placing process for film member on a same side as the implementation member, a forming process area by irradiating a laser beam from at least one of a first side of the semiconductor substrate having the implementation member and a second side that is an opposite side of the first side of the semiconductor substrate along the separation line with a focusing point of the laser beam aligned with a substance in the semiconductor substrate and severing/removing at least one semiconductor chip at the separation line from the semiconductor substrate.
申请公布号 US7550367(B2) 申请公布日期 2009.06.23
申请号 US20050199132 申请日期 2005.08.09
申请人 DENSO CORPORATION 发明人 TAMURA MUNEO;SOUKI YASUO
分类号 H01L21/00 主分类号 H01L21/00
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