发明名称 Chamberless substrate handling
摘要 A particle beam system having a beam source for generating a particle beam and a vacuum air bearing. The beam source is mounted to a first side of the vacuum air bearing, with an active side of the vacuum air bearing disposed on an opposing second side of the vacuum air bearing. The active side is adapted to receive and retain a substrate. A beam port is formed completely through the vacuum air bearing from the first side to the second side. Means are provided for moving the substrate across the second side of the vacuum air bearing and positioning the substrate under the beam port. Means are also provided for sealing an interior of the beam source from exposure to atmosphere through the beam port.
申请公布号 US7550743(B1) 申请公布日期 2009.06.23
申请号 US20070690176 申请日期 2007.03.23
申请人 KLA-TENCOR CORPORATION 发明人 MASNAGHETTI DOUGLAS K.
分类号 H01J33/02;H01J37/18 主分类号 H01J33/02
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