PHOTOSENSITIVE COMPOUND AND PHOTORESIST COMPOSITION INCLUDING THE SAME

摘要

A photosensitive compound and a photoresist composition containing the same are provided to secure smaller-sized polymer than common photoresist polymers and to prevent the generation of scum after the development. A photosensitive compound has a structure selected from the group consisting of the formula 1a and 1b. In the formula 1a, n is 0 or 1; x is 1, 2, 3, 4 or 5; y is 2, 3, 4, 5 or 6; z is 0, 1, 2, 3 or 4; R, R' and R" are independently C1-C30, more preferably C2-C20 hydrocarbonic groups; and R"' is hydrogen, C1-C30, more preferably C2-C20 hydrocarbonic groups. In the formula 1b, n, x, z, R, R', R" and R"' are the same as they are defined in the formula 1a; x' is 1, 2, 3 or 4; z' is 0, 1, 2 or 3; and p and m are independently 1 or 2.