| 摘要 |
A wafer cleaning apparatus is provided to prevent pollution of an edge of a wafer inserted in a wafer susceptor and ultra-pure water received in a cleaning bath by preventing an accumulation phenomenon of foreign material in the wafer susceptor. A cleaning bath(10) has a rectangular parallelepiped shape. The cleaning bath is filled by a cleaning solution which cleans a wafer(W). A cleaning solution supply line(20) supplies ultra-pure water to an inner part of the cleaning bath. The ultra pure water is supplied to the inner part of the cleaning bath through the cleaning solution supply line from an ultra-pure water storage bath. An outer cleaning bath(30) receives the ultra-pure water flowing to a top part of the cleaning bath. A bottom vessel(40) is arranged in a bottom side of the cleaning bath. A wafer supporter(50) is used in order to support the wafer. An ultrasonic transmitter(60) transmits an ultrasonic wave to the wafer.
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