| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To precisely discriminate the presence of the adhesion of residue in inspecting the presence of the adhesion of the residue consisting of an organic component to the surface of a resist pattern by applying an electron beam to a substrate which the resist pattern and an antireflection film being an organic film containing silicon overlie in this order from the upper side. <P>SOLUTION: The secondary electrons discharged from the inside of the substrate is pushed back to the substrate by applying a negative bias voltage across the substrate and a detection means for detecting the electrons discharged from the substrate while the reflected electrons discharged from the pole surface layer of the substrate are allowed to arrive at the detection means. By this constitution, even in the case where the residue is extremely thin or in the case where the width of the resist pattern is narrow, the residue can be precisely detected. Further, since an image based on the composition of a substance is obtained in the reflected electrons, the residue can be precisely detected even in the case where composition of the residue and that of the antireflection film are near. <P>COPYRIGHT: (C)2009,JPO&INPIT</p> |
