| 摘要 |
The invention relates to a method for producing an oriented-porosity dielectric material on a substrate comprising: a) vapour phase deposition on a substrate of a composite layer, comprising a material forming a matrix and a compound comprising chemical groups capable of being oriented under the effect of an electromagnetic field and/or photonic radiation; b) the treatment of the composite layer to obtain the cross-linking of the material forming a matrix; said method also comprising a step c) consisting of subjecting said substrate coated with said composite layer to an electromagnetic field and/or a photonic radiation, said step c) being carried out simultaneously with step a), when said layer is subjected to a photonic radiation or carried out before and/or simultaneously with step b), when said layer is subjected to an electromagnetic field, given that the electromagnetic field is applied in contact with the substrate, said step c) being carried out so as to align the chemical groups mentioned in step a) in a predetermined direction. Application to the field of microelectronics, separating membranes, diffusion membranes, molecular detectors, optical materials, polymer masks.
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