发明名称 |
COMBINATION OF STRUCTURE AND TWO OR MORE ACTIVE DAMPING SYSTEMS, LITHOGRAPHY DEVICE, AND PROJECTION ASSEMBLY |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a combination of a structure and two or more active damping systems capable of improving overall damping performance of a combination of the plurality of active damping systems. <P>SOLUTION: This combination of a structure and two or more damping system is an active damping system assembly damping vibration of at least a part of the structure, and includes a sensor measuring a positional amount of interface mass attached to the structure, and a plurality of active dampers each including an actuator applying force to the interface mass depending on a signal supplied by the sensor. Each of the plurality of active damping systems is connected to the interface mass. This structure can be formed into a projection system of a lithography device. <P>COPYRIGHT: (C)2009,JPO&INPIT |
申请公布号 |
JP2009127861(A) |
申请公布日期 |
2009.06.11 |
申请号 |
JP20080290443 |
申请日期 |
2008.11.13 |
申请人 |
ASML NETHERLANDS BV |
发明人 |
BUTLER HANS;VAN DER WIJST MARC WILHELMUS MARIA;DE PEE JOOST;DE HOON CORNELIUS ADRIANUS LAMBERTUS;BOSCHKER STIJN |
分类号 |
F16F15/02;G03F7/20;H01L21/027 |
主分类号 |
F16F15/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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