发明名称 COMBINATION OF STRUCTURE AND TWO OR MORE ACTIVE DAMPING SYSTEMS, LITHOGRAPHY DEVICE, AND PROJECTION ASSEMBLY
摘要 <P>PROBLEM TO BE SOLVED: To provide a combination of a structure and two or more active damping systems capable of improving overall damping performance of a combination of the plurality of active damping systems. <P>SOLUTION: This combination of a structure and two or more damping system is an active damping system assembly damping vibration of at least a part of the structure, and includes a sensor measuring a positional amount of interface mass attached to the structure, and a plurality of active dampers each including an actuator applying force to the interface mass depending on a signal supplied by the sensor. Each of the plurality of active damping systems is connected to the interface mass. This structure can be formed into a projection system of a lithography device. <P>COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009127861(A) 申请公布日期 2009.06.11
申请号 JP20080290443 申请日期 2008.11.13
申请人 ASML NETHERLANDS BV 发明人 BUTLER HANS;VAN DER WIJST MARC WILHELMUS MARIA;DE PEE JOOST;DE HOON CORNELIUS ADRIANUS LAMBERTUS;BOSCHKER STIJN
分类号 F16F15/02;G03F7/20;H01L21/027 主分类号 F16F15/02
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