发明名称 NITRIDE SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME
摘要 PROBLEM TO BE SOLVED: To provide a semiconductor device, in particular a nitride semiconductor device which is used in the manufacture of laser diodes, wherein peeling-off of the electrode is suppressed while suppressing the complexity of processes and a reduction in yield. SOLUTION: The nitride semiconductor device includes a P-type nitride semiconductor layer 1 with a ridge 2 on its surface, an SiO<SB>2</SB>film 3 covering at least the side face of the ridge 2, an adherence layer 4 which is formed on a surface of the SiO<SB>2</SB>film 3 and consists mainly of silicon, and a P-type electrode 5 formed on the upper surface of the ridge 2 and on a surface of the adherence layer 4. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009129943(A) 申请公布日期 2009.06.11
申请号 JP20070300004 申请日期 2007.11.20
申请人 MITSUBISHI ELECTRIC CORP 发明人 SHIOZAWA KATSUOMI;KANEMOTO KYOZO;OISHI TOSHIYUKI;KUROKAWA HIROSHI;KAWASAKI KAZUE;ABE SHINJI;SAKUMA HITOSHI
分类号 H01S5/042;H01S5/22;H01S5/323 主分类号 H01S5/042
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