| 摘要 |
PROBLEM TO BE SOLVED: To provide a transducer substrate manufacturing method, which improves the dimensional precision of a diaphragm, and to provide a transducer substrate and a transducer. SOLUTION: An impurity doping region 13 encircling a virtual projection region of a diaphragm 20 (Fig.1(f)) formed on one surface of a semiconductor substrate 10 is formed on the one surface of the semiconductor substrate 10 (Fig.1(b)). A thin film 14 serving as the base of the diaphragm 20 is formed on the one surface of the semiconductor substrate 10, and then a mask layer 15 having an opening 15a designed in pattern in correspondence to the plane shape of the diaphragm 20 is formed on the other surface of the semiconductor substrate 10 (Fig.1(d)). Subsequently, the mask layer 15 is etched, and the semiconductor substrate 10 is etched from the other surface until the depth of etching reaches the thin film 14, using the thin film 14 as an etching stopper layer. Hence the diaphragm 20 made up of a part of the thin film 14 is formed (Fig.1(f)). COPYRIGHT: (C)2009,JPO&INPIT
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