发明名称 Micromirror manufacturing method
摘要 A micro-mirror manufacturing method for dividing a plurality of micro-mirror devices each having at least one mirror, formed on a semiconductor wafer into individual micro-mirror devices can be provided. The manufacturing method comprises a step of depositing an inorganic protection layer on the mirror before separating the micro-mirror devices from the wafer and a step of removing the inorganic protection layer after separating the micro-mirror devices from the wafer.
申请公布号 US2009149004(A1) 申请公布日期 2009.06.11
申请号 US20070004598 申请日期 2007.12.24
申请人 ICHIKAWA HIROTOSHI;ISHII FUSAO 发明人 ICHIKAWA HIROTOSHI;ISHII FUSAO
分类号 H01L21/461 主分类号 H01L21/461
代理机构 代理人
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