发明名称 |
Micromirror manufacturing method |
摘要 |
A micro-mirror manufacturing method for dividing a plurality of micro-mirror devices each having at least one mirror, formed on a semiconductor wafer into individual micro-mirror devices can be provided. The manufacturing method comprises a step of depositing an inorganic protection layer on the mirror before separating the micro-mirror devices from the wafer and a step of removing the inorganic protection layer after separating the micro-mirror devices from the wafer.
|
申请公布号 |
US2009149004(A1) |
申请公布日期 |
2009.06.11 |
申请号 |
US20070004598 |
申请日期 |
2007.12.24 |
申请人 |
ICHIKAWA HIROTOSHI;ISHII FUSAO |
发明人 |
ICHIKAWA HIROTOSHI;ISHII FUSAO |
分类号 |
H01L21/461 |
主分类号 |
H01L21/461 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|