发明名称 |
Ozonated water mixture supply apparatus and method, and substrate treating facility with the apparatus |
摘要 |
Provided are an ozonated water mixture supply apparatus and method, and a substrate treating facility that receives an ozonated water mixture from the apparatus to treat a substrate. The ozonated water mixture supply apparatus includes a mixing line and distribution lines. The mixing line respectively receives a treating liquid and an ozonated water from a treating liquid supply line and an ozonated water supply line and mixes the treating liquid and the ozonated water to generate the ozonated water mixture satisfying a previously set concentration. Each of the distribution lines distributes the ozonated water mixture generated from the mixing line into a process unit. The mixing line includes a mixing valve and a static mixer. Therefore, the ozonated water mixture having the previously set concentration is generated and supplied using an in-line mixing method without requiring a mixing vessel such as a mixing tank.
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申请公布号 |
US2009145463(A1) |
申请公布日期 |
2009.06.11 |
申请号 |
US20080289751 |
申请日期 |
2008.11.03 |
申请人 |
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发明人 |
OH RAE-TAEK;KIM CHOON-SIK;BAE JEONG-YONG |
分类号 |
B08B7/04;B01F15/02;B08B13/00 |
主分类号 |
B08B7/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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