| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate cleaning device and a cleaning method surely removing different kinds of foreign substances deposited on or precipitated on the surface of an object to be cleaned of a substrate and cleaning during a one-time relative moving process of the substrate. SOLUTION: The substrate cleaning device is provided with a plasma cleaning means 5 blowing out secondary plasma of atmospheric pressure plasma toward the surface of the object to be cleaned of the substrate 1, a wiping-off cleaning means 4 disposed in parallel with the plasma cleaning means 5 and wiping and cleaning the surface of the object to be cleaned of the substrate 1 with the tape-like cleaning cloth 12, and a moving means 3 relatively moving the surface of the object to be cleaned of the substrate 1 in the parallel direction to the plasma cleaning means 5 and wiping-off cleaning means 4, and the wiping-off cleaning means 4 has a means for impregnating ozone water into the cleaning cloth 12. COPYRIGHT: (C)2009,JPO&INPIT
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