| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an exposure apparatus that effectively prevents deposition of particles to an original. <P>SOLUTION: The exposure apparatus is configured to expose a pattern formed on an original 100 onto a substrate using extreme ultraviolet light. It includes: an original stage 120 configured to move during exposure; an original chuck 110 which is provided on the original stage 120 and holds the original 100; an electrode 210 which is provided outside an electrostatic chuck 110 on the original stage 120 via an insulator 220; and a mirror cylinder 10 which is provided so that an absolute value of an electric potential difference with respect to the electrode 210 is greater than that of an electric potential difference with respect to the original 100 at a position facing the electrode 210. <P>COPYRIGHT: (C)2009,JPO&INPIT |
