发明名称 CURABLE RESIN COMPOSITION FOR FORMING PROTECTIVE FILM OF TRANSPARENT RESIN SUBSTRATE
摘要 PROBLEM TO BE SOLVED: To provide a curable resin composition capable of forming a protective film, on which sebum adhering the surface is unobtrusive and can be wiped off excellently while excellent scratch resistance is exhibited. SOLUTION: The curable composition includes an oxetane compound A having an oxetane ring in its molecule, an oxetane-based radical polymerizable monomer B having an oxetane ring and a radical polymerizable group in its molecule, a polyfunctional radical polymerizable monomer C having three or more radical polymerizable groups in its molecule, and a photopolymerization initiator D. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009126894(A) 申请公布日期 2009.06.11
申请号 JP20070301210 申请日期 2007.11.21
申请人 FUKUVI CHEM IND CO LTD 发明人 TAJIMA MUNETAKE;HASHIGUCHI HIDEHITO
分类号 C08F2/44;C08J7/04 主分类号 C08F2/44
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