发明名称 OPTICAL ISOLATOR USING PHOTONIC CRYSTAL AND METHOD OF MANUFACTURING THE SAME
摘要 PROBLEM TO BE SOLVED: To provide an optical isolator which is thinner and more compact than heretofore by forming a polarizer and a wavelength plate on the same substrate surface. SOLUTION: Cyclic trenches are produced on the substrate by electron beam lithography and dry etching (S1). Data for constitution design of the polarizer and the wavelength plate are obtained in order to alternately laminate multilayers on the substrate while maintaining cyclic rugged shapes in an x-axis direction of each layer by combining sputtering deposition and sputtering etching (S2). Based on the data for constitution design obtained at processing S2, an antireflection film is formed on the substrate and film-forming processing of laminating the multilayers which becomes the polarizer of a photonic crystal is performed (S3). Similarly based on the data for constitution design obtained at processing S2, the antireflection film is formed on the multilayers of the polarizer which is film-formed at processing S3 and film-forming processing of laminating the multilayers which become the wavelength plate of the photonic crystal is performed (S4). Thereby the optical isolator is manufactured. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009128879(A) 申请公布日期 2009.06.11
申请号 JP20070307191 申请日期 2007.11.28
申请人 RICOH OPT IND CO LTD 发明人 FUJII KAZUNORI
分类号 G02B27/28;G02B5/30 主分类号 G02B27/28
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