发明名称 SPUTTERING TARGET MATERIAL AND SPUTTERING TARGET OBTAINED THEREFROM
摘要 PROBLEM TO BE SOLVED: To provide a sputtering target material which can securely reduces the occurrence of arcing, and which can be restrained from being broken and cracked, and to provide a sputtering target obtained therefrom. SOLUTION: An almost planar sputtering target material is provided which has a rectangular sputtering surface, rectangular side surfaces and a rectangular bonding surface, wherein, a corner part formed resulting from abutting of at least the three surfaces among the plurality of surfaces composing the sputtering target material is chamfered. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009127125(A) 申请公布日期 2009.06.11
申请号 JP20070307400 申请日期 2007.11.28
申请人 MITSUI MINING & SMELTING CO LTD 发明人 MATSUMAE KAZUO
分类号 C23C14/34 主分类号 C23C14/34
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