发明名称 |
Exposure apparatus, manufacturing method thereof, and maintenance method of exposure apparatus |
摘要 |
A projection optical system PL is used to project an image of a pattern. A manufacturing method of an exposure apparatus includes: a positioning step of positioning the projection optical system at a predetermined position; and a support step of supporting the positioned projection optical system. The positioning step includes a step of moving the projection optical system upward from below at the time of positioning.
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申请公布号 |
US2009147228(A1) |
申请公布日期 |
2009.06.11 |
申请号 |
US20080314411 |
申请日期 |
2008.12.10 |
申请人 |
NIKON CORPORATION |
发明人 |
ONO KAZUYA;SHIMODA TOSHIMASA;ARAI YOICHI |
分类号 |
G03B27/42 |
主分类号 |
G03B27/42 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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