发明名称 ALIGNER APPARATUS
摘要 PROBLEM TO BE SOLVED: To detect the position at the outer circumferential end of a wafer accurately with a linear scan camera having a relatively small imaging range even if a wafer to which a film is stuck has a warp or an error in the conveyance position. SOLUTION: An aligner apparatus 10 is provided with a linear scan camera 2, a displacement sensor 6, a camming follow-up mechanism 3, and an eccentricity follow-up mechanism 4. During one revolution of a wafer W, the camming follow-up mechanism 3 is operated such that the outer circumferential end of the wafer W is located within the depth of field of the linear scan camera 2 based on the detection result by the displacement sensor 6, and the eccentricity follow-up mechanism 4 is operated such that the outer circumferential end of the wafer W is located within the imaging range of the linear scan camera 2 based on the image data by the linear scan camera 2. The linear scan camera 2 is moved in the vertical direction and the horizontal direction relative to the wafer W while following up the position at the outer circumferential end of the wafer W in the vertical direction and the horizontal direction during rotation of the wafer W. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009129945(A) 申请公布日期 2009.06.11
申请号 JP20070300012 申请日期 2007.11.20
申请人 TATSUMO KK 发明人 OSADA SHINJI
分类号 H01L21/68;G01B11/00;G01B11/26 主分类号 H01L21/68
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