发明名称 METHOD OF CLEANING EXHAUST AIR IN SUBSTRATE TREATMENT PROCESS
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a method for continuously and stably circulating and supplying cleaned and temperature/humidity-controlled air to a clean work space over a long period of time by cleaning the exhaust air containing molecular contaminants exhausted from the clean work space in a substrate treatment process, in manufacturing LCDs, or the like, using an adsorbing material, after performing temperature/humidity control first without stopping the operation of a manufacturing equipment line. <P>SOLUTION: A method for cleaning exhausted air in a substrate treatment process cleans and controls the temperature and humidity of the exhaust air, in a substrate treatment process in manufacturing LCDs to circulate and supply it. The exhaust air is taken into a humidifying/cooling/heating apparatus as process air, to obtain humidified/cooled/heated air; and this is passed through a batch-type temperature swing adsorbing device by using the air taken in from the indoors or the outdoors as regenerated air, and temperature/humidity control and removal of molecular contaminants and particulate contaminants are carried out. <P>COPYRIGHT: (C)2009,JPO&INPIT</p>
申请公布号 JP2009130212(A) 申请公布日期 2009.06.11
申请号 JP20070304947 申请日期 2007.11.26
申请人 SHINWA CONTROLS CO LTD;NIPPON SHOKUBAI CO LTD 发明人 HASHIMOTO MITSUYOSHI;KITAGUCHI SHINYA
分类号 H01L21/02 主分类号 H01L21/02
代理机构 代理人
主权项
地址
您可能感兴趣的专利