发明名称 PHOTOSENSITIVE ELEMENT AND METHOD FOR PRODUCING THE SAME
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a photosensitive element capable of laminating a photosensitive resin layer free of the generation of air voids on a substrate having fine irregularity used for optical nanoimprint, and to provide a method for producing such a photosensitive element capable of laying a photosensitive resin layer on a substrate having fine irregularity used for optical nanoimprint without generating air voids with an inexpensive laminator which performs heating and pressing under ordinary pressure. <P>SOLUTION: The photosensitive element which transfers fine irregularity having a surface roughness of 0.01-2μm comprises a support film (A), a photosensitive resin composition layer (B) and a protective film (C), wherein the Ra of a surface of the protective film (C) brought into contact with the photosensitive resin composition layer is 0.05-0.5μm. <P>COPYRIGHT: (C)2009,JPO&INPIT</p>
申请公布号 JP2009128759(A) 申请公布日期 2009.06.11
申请号 JP20070305651 申请日期 2007.11.27
申请人 HITACHI CHEM CO LTD 发明人 KAWAGUCHI TAKU
分类号 G03F7/11;B29C43/28;B29C43/52;B29L7/00;B29L9/00;B29L11/00;B32B7/02;C08J7/04 主分类号 G03F7/11
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