| 摘要 |
PROBLEM TO BE SOLVED: To provide an inspection device capable of detecting a defect, even when a defect spreads over a boundary of a pixel domain of a sensor. SOLUTION: One mode of this pattern inspection device is equipped with an XYθtable 102 for placing thereon a photomask 101 on which a pattern is formed; a line sensor 105 for imaging an optical image of the photomask 101 by being moved relatively to the XYθtable 102; a comparison part 52 for comparing first pixel data imaged by the line sensor 105 with first reference data on a position corresponding to a position of the first pixel data, and a comparison part 54 for comparing second pixel data imaged by the line sensor 105 on a position where an imaging position is shifted as much as a sub-pixel unit from the first pixel data with second reference data on a position corresponding to the position of the second pixel data. According to one mode, oversight of defects can be avoided or reduced. COPYRIGHT: (C)2009,JPO&INPIT |
