发明名称 MARKER STRUCTURE AND METHOD OF FORMING THE SAME
摘要 The invention relates to a marker structure for optical alignment of a substrate and provided thereon. The marker structure has a first reflecting surface at a first level and a second reflecting surface at a second level. A separation between the first level and the second level determines a phase depth condition. The marker structure further has an additional structure. The additional structure is arranged to modify the separation during manufacture of the marker structure. The invention further relates to a method of forming such a marker structure.
申请公布号 US2009147232(A1) 申请公布日期 2009.06.11
申请号 US20080328167 申请日期 2008.12.04
申请人 ASML NETHERLANDS B.V. 发明人 VAN HAREN RICHARD JOHANNES FRANCISCUS;LALBAHADOERSING SANJAYSINGH;MUSA SAMI;WARNAAR PATRICK;DOYTCHEVA MAYA ANGELOVA
分类号 G03B27/54;B32B9/00;B44C1/22;G03B27/32 主分类号 G03B27/54
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