发明名称 ALN CRYSTAL AND METHOD FOR GROWING THE SAME
摘要 <p>Disclosed is a method for growing an AlN crystal, which enables to stably grow an AlN crystal having large aperture and thickness. Specifically disclosed is a method for growing an AlN crystal, which comprises a step for preparing an SiC substrate (4) having a major surface (4m) wherein the density of micropipes (4mp) having a pipe diameter of not less than 1000 µm is 0 cm-2 and the density of micropipes (4mp) having a pipe diameter of not less than 100 µm but less than 1000 µm is not more than 0.1 cm-2, and a step for growing an AlN crystal (5) on the major surface (4m) by a vapor-phase process.</p>
申请公布号 WO2009072378(A1) 申请公布日期 2009.06.11
申请号 WO2008JP70648 申请日期 2008.11.13
申请人 SUMITOMO ELECTRIC INDUSTRIES, LTD.;SATOH, ISSEI;MIZUHARA, NAHO;TANIZAKI, KEISUKE;MIYANAGA, MICHIMASA;NAKAHATA, HIDEAKI 发明人 SATOH, ISSEI;MIZUHARA, NAHO;TANIZAKI, KEISUKE;MIYANAGA, MICHIMASA;NAKAHATA, HIDEAKI
分类号 C30B29/38;C30B23/06;H01L21/203;H01L21/205;H01L33/32 主分类号 C30B29/38
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