| 摘要 |
PROBLEM TO BE SOLVED: To provide a film deposition system where the feeding state of a film deposition gas is stabilized in film deposition treatment utilizing catalyst lines. SOLUTION: The film deposition system comprises: a first stage holding a pair of substrates S in a state of being erected and allowing the respective substrates S to face each other; a plurality of catalyst lines 15 arranged at a gap (reaction space) between the respective substrates S; and a gas feed part 20 feeding a film deposition gas to the reaction space. The gas feed part 20 comprises: a plurality of nozzles N1 arranged at the outside of the reaction space and elongating along the facial directions of the substrates S; and shielding pieces 22a surrounding the openings of the respective nozzles N1. COPYRIGHT: (C)2009,JPO&INPIT
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