| 摘要 |
PROBLEM TO BE SOLVED: To provide an in-line film-forming apparatus which does not produce a mono-content film and can perform vapor co-deposition without causing density unevenness. SOLUTION: The in-line film-forming apparatus comprises two deposition sources 2, 3, two deposition-preventing plates 5<SB>A</SB>, 5<SB>B</SB>, and a screen 6. Two deposition sources 2, 3 store different film-forming materials A, B and include openings 2a, 3a extending in the width direction of a substrate 4 which is perpendicular to the conveying direction T. The openings 2a, 3a, arranged in parallel with each other, are disposed respectively on the upstream and the downstream sides in the conveying direction T. Two plates 5<SB>A</SB>, 5<SB>B</SB>, partitioning a co-deposition chamber 1 from adjacent deposition chambers, are placed, in parallel to each other, on the upstream and the downstream sides in the conveying direction T and limit the deposition regions of the vapor from the openings 2a, 3a. The screen 6 limits the deposition regions of the vapor from the openings 2a, 3a so that these deposition regions coincide with the deposition regions of the substrate 4 limited by the plates 5<SB>A</SB>, 5<SB>B</SB>. Thereby, formation of the mono-content film is prevented and only the mixed film is formed on the substrate 4. COPYRIGHT: (C)2009,JPO&INPIT
|
